• welcome

    您好,歡迎光臨成都南光機器有限公司 English / 簡體中文
    ?GFC系列高性能全自動真空鍍膜機
    • 用途及特點
    • 規格參數
      用途及特點
      Use and Features
       
      ●適應于玻璃、塑膠等基片上鍍制各類光學薄膜和其它機能性裝飾薄膜的批量化生産
      ●采用******的電氣控制系統,良好的用户操作界面,大大减轻作业人员的负担
      ●RCS自動鍍膜控制系統******整個鍍膜過程自動完成
      ●基片架轉動采用磁流體密封技術******真空密封,中心驅動方式******薄膜産品的均勻性及重複性
      ●優化的配置、嚴格的品質控制******産品質量的穩定性和重複性
      ●排氣速率.鍍膜效率的提高,大大縮短了産品生産周期
      GFC系列高性能全自動真空鍍膜機
      Series GFC High Quality Vacuum Thin Film Coater
      技術參數
      Technical parameters
      真空室體
      Vacuum chamber
      Ø1300*1450mm,SUS304材質
      φ1,300*1,450mm,SUS304 material
       
      排氣系統
      Air exhaust system
      KT-500擴散泵2台,總排氣速率(加載水冷阱)11,000Pa.L/S
      Two sets of KT-500 diffusion pump, with a gross exhaust velocity (loaded with water-cooling trap) of 11,000Pa.L/S;
      極限真空≤2.0E-4Pa;排氣時間≤15min(大氣→4.0E-3Pa)
      Ultimate vacuum ≤2.0E-4Pa; exhaust time ≤15min (atmosphere→4.0E-3Pa)
      基片架
      Substrate holder
      Ø1200四叶扇形基片架, 3~30rpm转速;可选配行星基片架、翻转机构等
      φ1200 four-blade sector-shaped substrate holder, rotating speed 3~30rpm; a planet substrate holder or a turnover mechanism can also be matched;
      加熱機構
      Heating means
      ******350℃,PID控制;恒溫20min後溫度均勻性250±10℃
      Maximum 350℃, PID control; temperature homogeneity being 250±10℃ after 20 min of constant temperature control;
      石英監控儀
      Quartz monitor
      進口石英晶體膜厚監控儀;2點(或6點)晶振探頭
      Imported quartz crystal monitor on film depth, with two-point (or six-point) crystal probe;
      電子束蒸發源
      Electron beam evaporation source
      10KW电子枪 2台,12点坩埚和环形坩埚
      Two sets of 10KW electron gun, 12-point crucible or ring-shaped crucible;
      電阻蒸發源
      Resistance evaporation source
      功率4KW(一對、兩對或多對)
      Power of 4KW (one pair, two pairs or more pairs)
      膜厚修正板
      Film depth correction board
      2個自動可倒式膜厚修正機構
      Two automatic film depth correction mechanisms of collapsible type
      反應氣體
      Reaction gas
      APC自動壓強控制儀,質量流量計
      APC automatic pressure controller, mass flowmeter
      離子源
      Ion source
      可选配Kafman、Holl或RF離子源
      Available for matching of Kafman, Holl or RF ion source
      低溫抽氣裝置
      Low temperature evacuating equipment
      进口低溫抽氣裝置有效捕集水蒸汽,******温度-130℃
      The imported low-temperature evacuating equipment can effectively gather water vapor; minimum temperature -130℃
      RCS系統
      RCS system
      基于WINDOWS的全自動鍍膜軟件
      Windows-based full automatic coating software
      控制系統
      Control system
      控制櫃(液晶觸摸式彩色顯示器),遠程控制遙控盒
      Control cabinet (with liquid crystal color touch screen), remote-control box for remote control
       
      消耗能源
      Energy consumption
      3相,220/380VAC,50Hz;~70KVA
      Three-phase, 220/380VAC,50Hz;~70KVA
      水流量140L/min,壓力0.3~0.5MPa
      Water flow 140L/min, pressure 0.3~0.5MPa
      壓縮空氣0.5MPa~0.7MPa
      Compressed air 0.5MPa~0.7MPa
      重    量
      Weight
      淨重約4500Kg
      Net weight about 4,500 Kg
      安裝空間
      Installation space
      W4000mmxD6000mmxH2700mm
      W4,000mm×D6,000mm×H2,700mm
       

    本莊优子大嫂

    本莊优子大嫂

    HoMEfӴɩ